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Control of the deposition processes of zirconium (UWB/KFY)

Description

REX control system was used to control the process of high power impulse magnetron sputtering of zirconium at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa.

HW and SW

  • HW: ViewPAC - Windows CE 5.0
  • SW: REX control system
  • SW: Visualization - NI LabVIEW