Control of the deposition processes of zirconium (UWB/KFY)

Description

REX control system was used to control the process of high power impulse magnetron sputtering of zirconium at the average target power density of up to 2.22 kW/cm2 in a pulse. The depositions were performed using a strongly unbalanced magnetron with a planar zirconium target of 100 mm diameter at the argon pressure of 1 Pa.

HW and SW

• HW: ViewPAC - Windows CE 5.0
• SW: REX control system
• SW: Visualization - NI LabVIEW